Swedish Firm AlixLabs to Unveil Cost-Reducing Chip Manufacturing Technology in Eindhoven
Eindhoven, Friday 8 May 2026
On 4 June 2026, Swedish tech firm AlixLabs will unveil a new system in Eindhoven designed to dramatically reduce the cost and complexity of advanced microchip manufacturing.
Transitioning from Validation to Industrial Deployment
The launch event, taking place at the High Tech Campus Eindhoven, signifies a critical shift for AlixLabs from early technology validation to full-scale industrial deployment [1][2]. The firm’s Atomic Layer Etch Pitch Splitting (APS) technique leverages a plasma-based dry etching cyclic methodology to achieve nanostructure division, simplifying multi-patterning flows that currently plague advanced semiconductor manufacturing with high costs and complexity [1]. By enabling the fabrication of structures smaller than 20 nanometres, APS effectively bypasses the resolution limits inherent in traditional optical and electron beam lithography [3].
Strengthening Europe’s Semiconductor Ecosystem
The strategic decision to host the launch in Eindhoven highlights the Brabant region’s status as a linchpin in the global semiconductor value chain [GPT]. Eindhoven is already globally recognised as the home of lithography giant ASML and a thriving ecosystem encompassing integrated photonics and quantum technology [5]. By embedding its new technology within this established network, AlixLabs contributes directly to the broader goal of European strategic autonomy, ensuring that critical next-generation manufacturing capabilities remain resilient and regionally anchored [GPT].
A Collaborative Future for Advanced Patterning
The upcoming June event is designed to foster collaboration across the semiconductor ecosystem, bringing together researchers, investors, and industry peers to discuss process integration and the future of leading-edge manufacturing [2]. According to AlixLabs CEO and Founder Jonas Sundqvist, the APS system was developed with industrial scalability and manufacturability as foundational principles [1]. The proceedings will feature a 2-hour main technical programme outlining the system’s architecture and future scaling opportunities, followed by a dedicated networking session [1].